High purity silicon deposition by magnetron sputtering

Advanced Court of Science and Technology Magnetic Splane high -pure silicon SI is a commonly used surface treatment technology, which plays an important role in multiple fields. Magnetic sputtering is to transform the metal target on the surface of the solid material into ion state by turning the surface of the solid material in a vacuum environment, and then deposit it on the target background. During the specific implementation, the ions are accelerated and directed through a magnetic field, so that the ions can be uniformly deposited on the surface of the substrate and form a dense high -quality film layer.

The role of magnetic control sputtering high -pure silicon Si is mainly in the following aspects:

1. Improve the adhesion of the material: Magnetic sputtering can deposit the ions on the surface of the substrate to form a dense structure, thereby improving the adhesion of the material and the substrate. This is particularly important for some easy -to -fall materials and can ensure its stability in the process of use.

2. Improving the conductive performance of materials: High -pure silicon Si is widely used in the field of electronics and optoelectronics, and it has good conductive performance. The process of magnetic sputtering coating can control the conductive characteristics of the silicon film, so that it has higher conductivity and lower resistance, thereby improving the performance of electronic devices.

3. Prevent oxidation and corrosion: High -purity silicon Si film has high stability at room temperature, but it is easy to react with oxygen at high temperature or wet environment to oxidize. The magnetic sputtering process can be performed in a vacuum environment, effectively preventing the occurrence of oxidation reactions, and extending the service life of the silicon film.

4. Adjusting the optical properties of the material: Magnetic sputtering coating can not only improve the conductivity of the silicon film, but also regulate its optical properties. By regulating the plating process parameters and the materials used, you can regulate the refractive index and passage of the silicon film to meet the needs of different application areas.

All in all, magnetic control sputtering high -pure silicon SI can improve the adhesion of the material, improve the conductive performance, prevent oxidation and corrosion, and can also adjust the optical properties of the material.