High purity niobium plating by magnetron sputtering

Magnetic sputtering high -purity (NB) is a common surface treatment technology, which is commonly used in the preparation of metal coating, ceramic coating and thin film materials.

1. Introduction to the magnetic sputtering coating:

Magnetic sputtering is a technology that is controlled by magnetic fields in a high -voltage electric field with a tape particle and deposited on the base surface. By applying high -frequency or DC voltage to the target material, stimulate electrons in the gas and form electrical ions, and then use a magnetic field to guide the ion to the base surface to eventually form a film.

2. Preparation of high -purity sputtering target:

In order to prepare magnetic control sputtering coating, high purity targets are first prepared. Common preparation methods include arc melting and vacuum smelting. Due to the difficulty of preparation of high -purity 铌 materials, it is usually necessary to improve the purity through multiple melting and smelting.

3. Magnetic sputtering process parameters:

The process parameters of the magnetic sputtering high -purity gilding include the type of gas, gas pressure, coating time, the distance between the target and the base, and the base rotation speed. The selection of these parameters is related to the specific application, and it is necessary to optimize according to the performance requirements and cost considerations of the required film.

4. High -purity thin film characteristics:

The high -purity thin film prepared by magnetic control sputter has good chemical stability, mechanical hardness, abrasion resistance and conductivity. These characteristics make high -purity thin films widely used in optical coating, conductive coating, electronic devices and other fields.

5. Precautions for preparing high -quality film:

In the process of preparing magnetic control sputtering high -pure 铌 film, it is necessary to pay attention to details such as vacuum control, base surface treatment, and process control during the magnetic sputtering process. These details will affect the quality and performance of the film.

In short, magnetic control sputtering high -plating is a common surface treatment technology with extensive and excellent performance. In practical applications, process parameters need to be optimized according to specific actual needs to obtain high -quality thin films.