Our main products include flexible substrate coating, shielding materials, absorbing materials, precious metal slurries, and more!

banner
Current:Home >Products >Coating on flexible substrates >Magnetron sputtering coating >Magnetron Sputtering Plating of High Purity Iron
Magnetron sputtering coating
Magnetron Sputtering Plating of High Purity Iron
  • Magnetron Sputtering Plating of High Purity Iron

Magnetron Sputtering Plating of High Purity Iron


Advanced Institute Technology's magnetron sputtering coating of high-purity iron allows customization of various specifications as needed; Welcome to inquire.
Hotline

0755-22277778


Advanced Academy of Science and Technology Magnetic Splane high -pure iron (FE) is a commonly used surface treatment technology that is suitable for providing high -quality iron -based coating in various industries. Magnetic sputtering is a method of physical gas sedimentation. Using the role of magnetic fields and ion bombardment, the solid source material is converted into sputtering substances in the vacuum environment, and coverage layers are formed on the bottom material through sedimentation.

The working principle of magnetic sputtering is as follows: First of all, placed solid targets containing high -pure iron (Fe) materials in the vacuum chamber. Next, use a high -voltage power to discharge the gas to generate a plasma area. Then, the magnetic field is guided to the target area through the magnetic control system, so that the particles in the plasma area are moved along the track and hit the target surface under the action of the magnetic field. In this process, the atoms on the surface of the solid -state (Fe) (FE) will be bombarded by gas ions, gradually fall off and enter the gas phase with ion state. Finally, these ions will be deposited on the bottom material and form a high -pure iron (FE) film.

The advantages of magnetic control sputtering high pure iron (Fe) are the following points:

1. High -purity: Use high -purity iron (Fe) material as the target source, which can obtain high -purity coating to avoid pollution of impurities.

2. Uniformity: The plasma bombardment process under the regulation of the magnetic field can make the plating layer evenly cover the surface of the whole bottom material evenly to ensure the equality of the plating.

3. High adhesion: Due to the role of ion bombardment, the adhesion between the coating and the bottom material is enhanced and it is not easy to peel.

4. High -density density: During the sputtering of magnetic control, ion bombardment can increase the density of the coating, which improves corrosion resistance and wear resistance.

It should be noted that magnetic control sputtering high -pure iron (FE) technology needs to control multiple factors such as target source materials, sputter parameters and atmosphere to achieve the required coating quality. In addition, for different applications, you can also choose to add alloy elements or adopt a multi -layer thin film to further improve the performance of the coating.

Hotline
0755-22277778
13826586185(Mr.Duan)
Wechat QRcode Wechat QRcode