Copper oxide target deposited by magnetron sputtering

Magnetron sputtering copper oxide target (CuO) deposition is a common surface treatment technique aimed at forming a uniform and dense CuO film on the surface of the substrate material to improve its conductivity, corrosion resistance, insulation, and optical properties.

The principle of magnetron sputtering for copper oxide targets:

-Magnetron sputtering is a physical vapor deposition technique that involves placing a CuO target (source material) in a vacuum chamber, applying a magnetic field, and heating the target material to bombard it with high-energy electrons, causing CuO atoms on the surface of the target material to sputter out and deposit on the surface of the substrate material to form a thin film.

2. Advantages of magnetron sputtering copper oxide targets:

-High purity: During the sputtering process, there is no oxidant present and high-purity CuO films can be prepared.

-Control thickness: The thickness of the thin film can be controlled by adjusting the sputtering time and sputtering power.

-Uniformity: Sputtering technology can achieve uniform deposition on the entire substrate surface.

3. Application of magnetron sputtering copper oxide target:

-Optoelectronics: Copper oxide thin films have excellent optoelectronic properties and can be applied in fields such as solar cells and optoelectronic devices.

-Conductive thin film: CuO thin film has high conductivity and low resistivity, and is widely used in the preparation of conductive materials.

-Corrosion protection: CuO film has good corrosion resistance and can be applied as a protective coating on metal surfaces.

4. Key points for preparing copper oxide targets by magnetron sputtering:

-Target preparation: The purity and structure of the target material have a significant impact on the quality of the film. High purity CuO targets should be selected and their structural stability should be ensured.

-Sputtering parameter control: including sputtering power, sputtering distance, sputtering time and other parameters, which have a significant impact on the performance and quality of thin films, the optimal parameters need to be determined through experiments.

In summary, magnetron sputtering deposition of copper oxide targets is a widely used surface treatment technology in various fields. By selecting target materials and sputtering parameters reasonably, high-quality CuO films can be obtained, providing technical support for related applications.