The application of aluminum and its alloys has become increasingly common in various industrial fields. This article will focus on discussing
Magnetron sputtering high-purity aluminumExplore its application and advantages in PVD coating materials and various single target systems.
1. Unique properties of aluminum
-Light metal: Compared to metals such as steel, aluminum has a density of only 2.70 g/cm3, which is only about one-third of that of steel. This makes products using aluminum parts appear lightweight and easy to identify.
-Low density: The low density of aluminum is related to the lightness of its atomic nuclei, which makes it lighter compared to other metals. Only alkali metals and alkaline earth metals with high reactivity (such as potassium, calcium, etc.) can have a lower density than aluminum, but this is not applicable in structural materials.
-Lightweight alternative: One of the differences between aluminum and other metals is its low density. This characteristic makes aluminum very important in applications such as aerospace industry.
2. Advantages of Aluminum Alloy
-Strength and hardness: Pure aluminum is relatively soft and lacks strength. Therefore, in most applications, the use of aluminum alloys appears more suitable because they have higher strength and hardness. The yield strength of aluminum alloy can reach 200-600MPa, much higher than the 7-11MPa of pure aluminum.
-Resilience and ductility: Processed aluminum alloys have better toughness and ductility, making them easier to pull and extrude, which makes them easier to machine and cast.
-Conductivity and Thermal Conductivity: Although aluminum has only 59% conductivity and thermal conductivity compared to copper, it is an excellent performance compared to its lightweight characteristics. In addition, aluminum can superconducting at temperatures below 1.2K and magnetic flux greater than 100 Gauss.
3. Application of magnetron sputtering high-purity aluminum
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PVD technology coating materialMagnetron sputtering is a common physical vapor deposition (PVD) technique used to form thin films on surfaces. High purity aluminum is widely used in this technology, releasing aluminum atoms into a vacuum chamber through a sputtering source and forming high-quality Al films under the action of functional chemical gases. These films can play important roles in fields such as electronics, optics, and solar cells.
-Single target system: Aluminum is one of the most commonly used target materials in magnetron sputtering. The target material provides a source of atoms during the sputtering process. Aluminum targets with high purity can provide a more stable and uniform sputtering process, ensuring high-quality thin films during the preparation process. This type of target material is widely used in various industrial fields, such as electronics, aerospace, optics, etc.
Summary:
Aluminum and aluminum alloys, as lightweight and versatile materials, have a wide range of applications in various fields. The application of magnetron sputtering high-purity aluminum is particularly significant in PVD coating materials and various single target systems. Through magnetron sputtering technology, we can obtain high-quality
Aluminum filmThus, it plays an important role in fields such as electronics and optics. In order to ensure the stability of the sputtering process and the excellent quality of the thin film, high-purity aluminum targets play a key role in the preparation process. Therefore, the application of magnetron sputtering high-purity aluminum will play an important role in future technological development.
