Magnetron Sputtering Plating of High Purity Ruthenium Ru: A Peak Work from the Nanoworld to the Technological Field

In the rapid development of technology, magnetron sputtering, as a widely used thin film preparation technology, not only has important applications in flat displays, semiconductors, solar cells and other fields, but also plays a key role in nano processing and device manufacturing in scientific experimental research. This article will focus on the Advanced Institute of Science and TechnologyMagnetron sputtering deposition of high-purity ruthenium RuThe application of magnetron sputtering equipment in various single target material systems, multi-target sputtering systems, and ion sputtering systems, and its unique charm in the manufacturing of related products.

1、 Characteristics and Preparation Methods of High Purity Ruthenium Ru

1. Characteristics of high-purity ruthenium Ru

High purity ruthenium (Ru) is a material with excellent physical and chemical properties, characterized by high hardness, high melting point, excellent chemical stability, and good oxidation resistance. Therefore, it is highly suitable for the preparation and surface modification of various special materials.

2. Preparation method

Magnetron sputtering is a commonly used preparation method to obtain high-quality and high-purity ruthenium Ru thin films. By using high-purity target material in a vacuum environment, atoms or ions on the surface of the target material are sputtered onto the substrate surface under the action of a magnetic field, thereby obtaining a thin film with the desired properties.

2、 Application of High Purity Ruthenium Ru Coating by Magnetron Sputtering in Single Target System

1. Field of flat display

Magnetron sputtering deposition of high-purity ruthenium Ru technology is widely used in the manufacturing of flat display devices such as liquid crystal display panels and organic light-emitting diodes. High purityRuthenium Ru thin filmIt can be used as an electrode material with low resistivity and good conductivity, which can improve the response speed and display effect of display devices.

2. Semiconductor field

In the manufacturing process of semiconductor devices, magnetron sputtering of high-purity ruthenium Ru can be used to prepare metal thin films, intermetallic compound thin films, and multilayer structured thin films. These thin films play an important role in integrated circuits, sensors, solar cells, and other fields, improving the performance and reliability of devices.

3、 Application of High Purity Ruthenium Ru Coating by Magnetron Sputtering in Multi Target Sputtering System

Multi target sputtering system is a device that can simultaneously use multiple target materials for sputtering, and magnetron sputtering plays an important role in depositing high-purity ruthenium Ru.

1. Preparation of optical components

By using a multi-target sputtering system and adjusting the sputtering power and ratio of the target material, multi-layer structured optical films such as mirrors and color filters can be prepared. High purity ruthenium Ru has excellent transparency and corrosion resistance in these optical components, which can improve the stability and optical performance of the components.

2. Manufacturing of energy-saving glass

By utilizing the magnetron sputtering technique in a multi-target sputtering system to deposit high-purity ruthenium Ru, thin films for energy-saving glass can be prepared. These films have excellent thermal insulation performance and optical transparency, which can effectively reduce the energy consumption of buildings, improve indoor comfort, and save energy.

4、 Application of High Purity Ruthenium Ru Coating by Magnetron Sputtering in Ion Sputtering System

Ion sputtering is a technique that uses ion bombardment to form a high-speed ion beam on the surface of a target material. Combined with magnetron sputtering to deposit high-purity ruthenium Ru, it can further improve the quality and performance of thin films.

1. Nanoprocessing

Ion sputtering can form fine nanostructures, and by controlling the energy and dose of the ion beam, precise manufacturing and control of high-purity ruthenium Ru thin films can be achieved. This is of great significance for nanoprocessing and nanodevice manufacturing.

2. Scientific experimental research

The ion sputtering system combined with magnetron sputtering to deposit high-purity ruthenium Ru technology can prepare high-quality thin film samples for scientific experiments and research. These samples can be used to characterize the electrical, magnetic, optical and other physical properties of materials, and to further study the characteristics and application potential of high-purity ruthenium Ru.

Conclusion:

　　Magnetron sputtering deposition of high-purity ruthenium RuAs an important thin film preparation technology, it has been widely and deeply applied in various single target systems, multi-target sputtering systems, and ion sputtering systems. It not only plays an important role in fields such as flat displays, semiconductors, solar cells, and energy-saving glass, but also has unique charm in scientific experimental research and related product manufacturing such as nanoprocessing. With the continuous development of technology and the increasing demand for applications, it is believed that magnetron sputtering deposition of high-purity ruthenium Ru will continue to emit light and heat in future technological fields, creating a better future.